Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch²

• Cheng Huang,
• Alexander Förste,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2015, 6, 1205–1211, doi:10.3762/bjnano.6.123

• plasmonic resonance; metal islands; metal nanostructures; metal polymer blend lithography (metal PBL); nano-patterned template; nanoscale discs; optical transmission; perforated metal film; polymer phase separation; poly(methyl methacrylate) (PMMA); polystyrene (PS); self-assembly; spin-coating; surface

• metal polymer blend lithography (metal PBL). The polymer blend lithography was applied in our earlier reports to fabricate self-assembled monolayer (SAM) patterns (monolayer PBL) [21], which were used, e.g., for the selective growth of ZnO nanostructures [22]. Instead of silicon wafers, other materials

• metal islands or holes on a substrate with a size of 1 inch × 1 inch. Results and Discussion Metal polymer blend lithography (metal PBL) for metal islands or perforated films The metal polymer blend lithography method (metal PBL) is schematically demonstrated in Figure 1. The spin casting of the